The research group, headed by Prof. Dr.-Ing Achim Trautmann, is involved in the development and adaptation of micro/nanotechnological processes for the manufacture of components and systems at chip and wafer level. The focus is on implementation in applicable processes.

The activities focus particularly on cleanroom processes, primarily plasma processes. In deposition, new material/material combinations are also being studied in addition to conventional microtechnological materials. Plasma-based processes are primarily used in structuring, such as "Deep Reactive Ion Etching".

In addition to the process optimisation itself, the focus is also on the physical and chemical analysis and characterisation of the microtechnical systems and characteristics of the materials used. The main objective here is to investigate the interactions between the processes and materials used and the application-related characteristics of the micro- and nanosystems produced.